Dr. Taeyoung Kim (김태영;金泰永)


Taeyoung Kim

Biographical Sketch

Dr. Kim is currently a senior software engineer at Intel Corporation, Hillsboro, OR, USA, where he develops channel analysis tools for signal integrity and power integrity solutions for high-speed I/O interconnect and package of the semiconductor devices. He has authored or co-authored more than 30 papers in scientific journals and conference proceedings. He is an Associate Editor of Integration, the VLSI Journal since 2017.

He has received the M.S. degree in electrical engineering from University of Virginia, Charlottesville, VA, USA in 2012, and the Ph.D. degree in computer science from University of California, Riverside, CA, USA in 2017. His dissertation was titled "System-level Electromigration-Induced Dynamic Reliability Management." During his Ph.D. study, he received a best research award at ACM Ph.D. Forum at Design Automation Conference (DAC) in 2015 and a dissertation award from the University of California in 2017.

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Last updated on Mar 2, 2019 12:43 AM